1-Zone 1200°C 50mm OD Split Tube Furnace

1200°C PE/CVD Furnace with RF Generator, Gas Mix & Pumping System (STF1200 Series)

The STF1200 series is a Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) furnace system, designed for advanced material processing with precise temperature control, enhanced by a RF generator, gas mixing system, and pumping system. This furnace provides efficient solutions for creating thin films, coatings, and other materials that require precise atmospheric and temperature conditions.

Key Features:

• Compact and Portable Design:

  • The furnace is designed to be compact and mobile, making it easy to integrate into various laboratory and production environments.

• Advanced Heating and Insulation:

  • The Kanthal® (Sweden) A1 2.0 resistance coil wire heating elements are embedded in Mitsubishi® (Japan) 1500-grade fiber alumina insulation, offering excellent thermal efficiency.
  • The dual-layer steel housing minimizes heat loss to the exterior while ensuring durability.

• Efficient Temperature Control:

  • The furnace is controlled by a Eurotherm® (UK) digital controller that provides precise PID microprocessor-based self-tuning for optimal temperature control with minimal overshoot.
  • Temperature range: Max. 1200°C and constant working temperature of 1100°C.
  • Thermocouple type: Type K for reliable and accurate temperature measurement.
  • Heating rate: Less than 30°C/min, suitable for rapid temperature adjustments.

• Atmospheric Control and Gas Flow:

  • The furnace includes stainless steel vacuum sealing flanges with valves, a vacuum gauge, and four thermal ceramic blocks to manage gas flow.
  • Multiple atmosphere processes can be handled in a single cycle, such as binder burn-out in air and parts sintering under vacuum or inert gas environments.

• Vacuum and Pumping System:

  • The vacuum pump is available for purchase, and a vacuum mobile cart can be added when the pump and digital vacuum controller are purchased together.
  • The system ensures that the furnace chamber maintains the required vacuum level during operation.

• High-Frequency RF Generator for PECVD:

  • The RF generator operates with 13 MHz frequency with excellent stability (±0.005%).
  • The generator provides an adjustable output power range from 5 to 500 watts, allowing precise control of the plasma deposition process.
  • Automatic matching ensures optimal performance by adjusting for impedance changes during operation.
  • The RF output port is 50 Ω, N-type, female, suitable for connecting RF cables.

• Computer Interface and Monitoring:

  • The system has a built-in computer interface for remote control and monitoring, allowing users to connect the furnace to a PC.
  • The Eurotherm® controller enables users to save and export test results for further analysis or record-keeping.

• Safety and Protection:

  • Overheat protection automatically shuts down the furnace if the temperature exceeds the acceptable range or if there’s a thermocouple failure.
  • Power failure protection ensures that the furnace resumes operation from the point where it was interrupted once power is restored.
  • Warning: The furnace should never be filled with explosive gases such as Hydrogen, Carbon Monoxide, or Methane, which could pose significant safety risks.

Specifications:

Furnace:

• Tube Material: Quartz
• Heating Element: Kanthal® A1 2.0 resistance coil wire
• Refractory Lining: Mitsubishi® 1500-grade fiber alumina
• Temperature Range:
  • Max Working Temperature: 1200°C
  • Constant Working Temperature: 1100°C
  • Thermocouple: Type K
• Temperature Control:
  • PID Controller (Eurotherm® UK)
  • Temperature Control Precision: ±1°C (±1.8°F)
  • Heating Rate: < 30°C/min

Vacuum Pump and Sealing System:

• Vacuum Sealing Flanges: Stainless steel flanges with valves and a vacuum gauge for sealing and gas management.
• Vacuum Gauge: Included to monitor the internal chamber pressure.
• Vacuum Mobile Cart: Available with the purchase of a vacuum pump and digital vacuum controller.

Electrical Requirements:

• Furnace Electrical: 208-240V, 50/60Hz, single-phase
• RF Generator Electrical: 208-240V, 50/60Hz
• RF Output Power: Adjustable from 5 to 500 watts (in ±1% steps)
• RF Frequency: 13 MHz with ±0.005% stability
• Reflection Power: 200 watts max
• RF Output Port: 50 Ω, N-type female

Safety Features:

• Overheat Protection: Automatic shut down when exceeding the temperature range or thermocouple failure.
• Power Failure Protection: Furnace resumes operation after power restoration.
• Warning: Hazardous gases (e.g., Hydrogen, CO, Methane) must not be used.

Applications:

The STF1200 series CVD/PECVD Furnace is ideal for:

• Thin Film Deposition: Used in semiconductor manufacturing, coatings, and materials processing.
• Plasma Treatment: Enhancing surface properties, etching, and other plasma-based processes.
• Advanced Research: Suitable for research in material science, especially when precise atmospheric and temperature conditions are required for thin film production or plasma-enhanced processes.