Ai RF500 Series RF Generator
The Ai RF500 RF generator provides reliable 500-watt output power with a stable 13.56MHz frequency, ideal for DIY PECVD systems and applications such as plasma etching, cleaning, and polymerization. Its robust design supports up to 150mm OD tubes, ensuring versatility for a range of plasma-based processes.
Key Features:
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Power Output: Adjustable 5–500 watts with precise +/-1% step control.
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Frequency Stability: 13.56MHz with an impressive +/-0.005% accuracy.
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Automatic Matching: Seamless impedance matching for efficient operation.
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RF Output Port: 50 Ω N-type, female connector for compatibility with various systems.
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Cooling: Air-cooled system ensures stable and continuous operation.
Specifications:
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Electrical Requirements: 208-240 volts, 50/60 Hz
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Reflection Power: Up to 200 watts maximum
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Supported Tubes: Up to 150mm OD
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Construction: Durable and designed for consistent performance in demanding conditions
Applications:
- Plasma-enhanced chemical vapor deposition (PECVD)
- Plasma etching and surface modification
- Plasma cleaning and contamination removal
- Plasma polymerization for material coatings
The Ai RF500 RF generator combines precision, power, and reliability, making it a top choice for both research and industrial plasma systems.